Philip D. Rack |
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J.D. Fowlkes, S.J. Randolph, P.D. Rack, Growth and Simulation of High – Aspect Ratio Nanopillars by Primary and Secondary Electron – Induced Deposition Journal of Vacuum Science and Technology B, Microelectronics and Nanometer Structures, Vol 23, no 6, pp 2825-2832 (November/December 2005).
The following article appeared in Journal of Vacuum Science and Technology B, Microelectronics and Nanometer Structures, Vol 23, no 6, pp 2825-2832 (November/December 2005) and may be found at (URL/link for published article abstract).
Copyright (2005) American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics.